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Model calculations of (a) location of plasma-afterglow boundary as a function of pressure, (b) Thiele modulus as a function of pressure, and (c) dimensionless charge density as a function of dimensionless distance in spatial afterglow (Abuyazid et al., Nat. Comm., 2023).

J. Beckers et al., “Physics and applications of dusty plasmas: The Perspectives 2023,” Phys. Plasmas 30, 120601 (2023). https://doi.org/10.1063/5.0168088

R. Garza, N. Bartlett, J. Crouse, A. Herschberg, R. M. Sankaran, M. A. Hossain, and D. N. Ruzic, “Stannane in extreme ultraviolet lithography and vacuum technology: Synthesis and characterization,” J. Vac. Sci. Technol. A 41, 063209 (2023). https://doi.org/10.1116/6.0002980

N. H. Abuyazid, N. B. Uner, S. M. Peyres, and R. M. Sankaran, “Charge decay in the spatial afterglow of plasmas and its impact on diffusion regimes,” Nat. Comm. 14, 6776 (2023). https://doi.org/10.1038/s41467-023-42442-9

J. Wang, N. B. Uner, S. E. Dubowsky, M. P. Confer, R. Bhargava, Y. Y. Sun, Y. T. Zhou, R. M. Sankaran, and J. S. Moore, “Plasma electrochemistry for carbon-carbon bond formation via pinacol coupling,” J. Am. Chem. Soc. 145, 10470-10474 (2023). https://doi.org/10.1021/jacs.3c01779

J. Z. Kang, K. Xu, H. W. Lee, S. Bhattacharya, Z. J. Zhao, Z. Y. Wang, R. M. Sankaran, and W. J. Zhu, “High Ion/Ioff ratio 4H-SiC MISFETs with stable operation at 500 oC using SiO2/SiNx/Al2O3 gate stacks,” Appl. Phys. Lett. 122, 082906 (2023). https://doi.org/10.1063/5.0134729